Plasma Deposition of Thiophene Derivatives Under Atmospheric Pressure | Zendy

Dams R. | Zendy; Vangeneugden D. | Zendy; Vanderzande D. | Zendy

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Plasma Deposition of Thiophene Derivatives Under Atmospheric Pressure

Author(s) -

Dams R.,

Vangeneugden D.,

Vanderzande D.

Publication year - 2006

Publication title -

chemical vapor deposition

Language(s) - English

Resource type - Journals

eISSN - 1521-3862

pISSN - 0948-1907

DOI - 10.1002/cvde.200606483

Subject(s) - x ray photoelectron spectroscopy , fourier transform infrared spectroscopy , thiophene , atmospheric pressure plasma , analytical chemistry (journal) , atmospheric pressure , monomer , polymer , deposition (geology) , materials science , infrared spectroscopy , fourier transform spectroscopy , spectroscopy , conjugated system , infrared , plasma , chemistry , chemical engineering , organic chemistry , optics , paleontology , physics , oceanography , quantum mechanics , sediment , engineering , biology , geology

Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3‐methylthiophene, and 3,4‐ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X‐ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, UV‐vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4‐ethylenedioxythiophene). Conductivities of up to 1 × 10 —2 S cm –1 are measured.

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