Growth of Thin Films of Molybdenum and Tungsten Oxides by Combustion CVD Using Aqueous Precursor Solutions | Zendy

Davis M.J. | Zendy; Benito G. | Zendy; Sheel D.W. | Zendy; Pemble M.E. | Zendy

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Growth of Thin Films of Molybdenum and Tungsten Oxides by Combustion CVD Using Aqueous Precursor Solutions

Author(s) -

Davis M.J.,

Benito G.,

Sheel D.W.,

Pemble M.E.

Publication year - 2004

Publication title -

chemical vapor deposition

Language(s) - English

Resource type - Journals

eISSN - 1521-3862

pISSN - 0948-1907

DOI - 10.1002/cvde.200306260

Subject(s) - molybdenum , x ray photoelectron spectroscopy , tungsten , scanning electron microscope , molybdate , amorphous solid , aqueous solution , materials science , thin film , analytical chemistry (journal) , inorganic chemistry , chemistry , chemical engineering , metallurgy , nanotechnology , crystallography , chromatography , engineering , composite material

Using combustion (C) CVD, layers of molybdenum and tungsten oxides have been deposited on glass and silicon at low temperatures. Inexpensive ammonium salts of molybdate and metatungstate ions were used as precursors and were delivered to the coating flame as an aqueous solution using a nebulizer. The resulting films were analyzed by scanning electron microscopy (SEM), energy‐dispersive analysis of X‐rays (EDAX), Rutherford backscattering (RBS), X‐ray photoelectron spectroscopy (XPS), and X‐ray diffraction (XRD). These indicated that the films were continuous, moderately smooth, and consisted of amorphous, disordered molybdenum and tungsten trioxides.

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