Lg = 25 nm InGaAs/InAlAs high-electron mobility transistors with both fT and fmax in excess of 700 GHz
Author(s) -
Hyeon-Bhin Jo,
Do-Young Yun,
Ji-Min Baek,
JungHee Lee,
TaeWoo Kim,
Dae-Hyun Kim,
Takuya Tsutsumi,
Hiroki Sugiyama,
Hideaki Matsuzaki
Publication year - 2019
Publication title -
applied physics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.911
H-Index - 94
eISSN - 1882-0786
pISSN - 1882-0778
DOI - 10.7567/1882-0786/ab1943
Subject(s) - transconductance , high electron mobility transistor , substrate (aquarium) , materials science , transistor , optoelectronics , gallium arsenide , electron , physics , oceanography , quantum mechanics , geology , voltage
In this paper, we report an L g = 25 nm InGaAs/InAlAs HEMT on InP substrate that delivers excellent high-frequency characteristics. The device exhibited a value of maximum transconductance ( g m_max ) = 2.8 mS μ m −1 at V DS = 0.8 V and on-resistance ( R ON ) = 279 Ω μ m. At I D = 0.56 mA μ m −1 and V DS = 0.5 V, the same device displayed an excellent combination of f T = 703 GHz and f max = 820 GHz. To the best of the authors’ knowledge, this is the first demonstration of a transistor with both f T and f max over 700 GHz on any material system.
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