Open AccessThe Properties of Atomic Layer Deposited Al-Doped ZnO Films Using H2O and O3 As Oxidants
Author(s) -
Min Yi Kim,
Young Joon Cho,
Hyo Sik Chang
Publication year - 2015
Publication title -
jeon'gi jeonja jaeryo haghoe nonmunji/jeon-gi jeonja jaeryo hakoe nonmunji
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2015.28.10.652
Subject(s) - atomic layer deposition , x ray photoelectron spectroscopy , materials science , doping , thin film , layer (electronics) , electrical resistivity and conductivity , analytical chemistry (journal) , microstructure , oxygen , chemical engineering , nanotechnology , optoelectronics , chemistry , composite material , organic chemistry , electrical engineering , engineering