Open AccessElectrical Properties of Molybdenum Metal Deposited by Plasma Enhanced – Atomic Layer Deposition of Variation Condition
Author(s) -
Taewaen Lim,
Hyo Sik Chang
Publication year - 2019
Publication title -
han'gug jaeryo haghoeji/han-guk jaeryo hakoeji
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.153
H-Index - 10
eISSN - 2287-7258
pISSN - 1225-0562
DOI - 10.3740/mrsk.2019.29.11.715
Subject(s) - materials science , molybdenum , atomic layer deposition , layer (electronics) , metal , plasma , deposition (geology) , variation (astronomy) , metallurgy , chemical engineering , analytical chemistry (journal) , nanotechnology , environmental chemistry , chemistry , paleontology , physics , quantum mechanics , sediment , engineering , biology , astrophysics