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Аналитическая модель атомно-слоевого осаждения тонких пленок на стенки цилиндрических отверстий с высоким аспектным отношением
Author(s) -
А.В. Фадеев,
К.В. Руденко
Publication year - 2018
Publication title -
журнал технической физики
Language(s) - Russian
Resource type - Journals
eISSN - 1726-748X
pISSN - 0044-4642
DOI - 10.21883/jtf.2018.08.46319.2625
Subject(s) - psychology

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