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With the rapid advances of functional dielectric metasurfaces and theirintegration on on-chip nanophotonic devices, the necessity of metasurfacesworking in different environments, especially in biological applications,arose. However, the metasurfaces' performance is tied to the unit cell'sefficiency and ultimately the surrounding environment it was designed for, thusreducing its applicability if exposed to altering refractive index media. Here,we report a method to increase a metasurface's versatility by covering thehigh-index metasurface with a low index porous SiO$_2$ film, protecting themetasurface from environmental changes while keeping the working efficiencyunchanged. We show, that a covered metasurface retains its functionality evenwhen exposed to fluidic environments.

Porous SiO$_2$ coated dielectric metasurface with consistent performance independent of environmental conditions