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Increasing miniaturization and complexity of nanostructures requireinnovative metrology solutions with high throughput that can assess complex 3Dstructures in a non-destructive manner. EUV scatterometry is investigated forthe characterization of nanostructured surfaces. The reconstruction is based ona rigorous simulation using a Maxwell solver based on finite-elements and isstatistically validated with a Markov-Chain Monte Carlo sampling method. Hereit is shown that this method is suitable for the dimensional characterizationof the nanostructures and the investigation of oxide or contamination layers.In comparison to grazing-incidence small-angle X-rayscattering (GISAXS) EUVallows to probe smaller areas. The influence of the divergence on thediffracted intensities in EUV is much lower than in GISAXS, which also reducesthe computational effort of the reconstruction.

On uncertainties in the reconstruction of nanostructures in EUV scatterometry and grazing incidence small-angle X-ray scattering