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The optical constants of ruthenium in the spectral range 8 nm to 23.75 nmwith their corresponding uncertainties are derived from the reflectance of asputtered ruthenium thin film in the Extreme Ultraviolet (EUV) spectral rangemeasured using monochromatized synchrotron radiation. This work emphasizes thecorrelation between structure modelling and the reconstructed opticalparameters in a detailed inverse-problem optimization strategy. ComplementaryX-ray Reflectivity (XRR) measurements are coupled with Markov chain Monte Carlo(MCMC) based Bayesian inferences and quasi-model-independent methods to createa model factoring the sample's oxidation, contamination, and surface roughness.The sensitivity of the modelling scheme is tested and verified againstcontamination and oxidation. A notable approach mitigating the highdimensionality of the reconstruction problem is elaborated with the results ofthis work compared to two previously published datasets. The presented datasetis of high interest for the continuing development of Extreme UltravioletLithography (EUVL) and EUV astronomy optical systems.

Time-frequency analysis assisted reconstruction of ruthenium optical constants in the sub-EUV spectral range 8nm-23.75nm