Open AccessOptical and Electrical Properties of TiO2/Co/TiO2Multilayer Films Grown by DC Magnetron Sputtering
Author(s) -
Marcos G. Valluzzi,
Lucas G. Valluzzi,
Marcos Meyer,
M.A. Hernández-Fenollosa,
L. C. Damonte
Publication year - 2018
Publication title -
advances in condensed matter physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.314
H-Index - 26
eISSN - 1687-8124
pISSN - 1687-8108
DOI - 10.1155/2018/1257543
Subject(s) - materials science , kelvin probe force microscope , sputter deposition , substrate (aquarium) , optoelectronics , transmittance , absorption edge , fermi level , work function , sputtering , absorption (acoustics) , thin film , visible spectrum , absorption spectroscopy , cavity magnetron , spectroscopy , optics , analytical chemistry (journal) , atomic force microscopy , nanotechnology , band gap , composite material , chemistry , electron , oceanography , physics , layer (electronics) , quantum mechanics , chromatography , geology
Transparent oxide multilayer films of TiO 2 /Co/TiO 2 were grown on glass substrate by DC magnetron sputtering technique. The optical and electrical properties of these films were analyzed with the aim of substituting ITO substrate in optoelectronic devices. The samples were characterized by UV-visible spectroscopy, atomic force microscopy (AFM), and Kelvin probe force microscopy (KPFM). The effect of Co interlayer thickness (4, 8, and 12 nm) on the transmittance spectra yielded an optical absorption edge shift. The work function of these films was determined by KPFM technique allowing us to predict the Fermi level shift by extending the model for pure materials to our multilayer system. The Fermi level and optical absorption edge seem to be correlated and shifted toward lower energies when Co interlayer thickness is increased.