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A new method to fabricate the multiwavelength DFB semiconductor laser array (MLA) is proposed for the first time based on sampled grating and s-bent waveguide. According to the detailed precision analysis, the lasing wavelength accuracy of the proposed structure is significantly improved. Because the common holography exposure and micrometer photolithography are used to fabricate the sampled grating and the bent waveguide in this method, the fabrication cost is very low. Therefore, it offers a suitable method for massive fabrication.

A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array