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In this study, we examine the mechanisms leading to 29 Si incorporation into highly enriched 28 Si films deposited by hyperthermal ion beams at elevated temperatures in the dilute presence of natural abundance silane (SiH 4 ) gas. Enriched 28 Si is a critical material in the development of quantum information devices because 28 Si is free of nuclear spins that cause decoherence in a quantum system. We deposit epitaxial thin films of 28 Si enriched in situ beyond 99.99998 % 28 Si onto Si(100) using an ion beam deposition system and seek to develop the ability to systematically vary the enrichment and measure the impact on quantum coherence. We use secondary ion mass spectrometry to measure the residual 29 Si isotope fraction in enriched samples deposited from ≈ 250 °C up to 800 °C. The 29 Si isotope fraction is found to increase from &lt; 1 × 10 -6 at the lower temperatures, up to &gt; 4 × 10 -6 at around 800 °C. From these data, we estimate the temperature dependence of the incorporation fraction, s , of SiH 4 , which increases sharply from about 2.9 × 10 -4 at 500 °C to 2.3 × 10 -2 at 800 °C. We determine an activation energy of 1.00(8) eV associated with the abrupt increase in incorporation and conclude that below 500 °C, a temperature independent mechanism such as activation from ion collisions with adsorbed SiH 4 molecules is the primary incorporation mechanism. Direct incorporation from the adsorbed state is found to be minimal.

physical review materials

Temperature-dependent <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mmultiscripts><mml:mi mathvariant="normal">Si</mml:mi><mml:mprescripts /><mml:none /><mml:mn>29</mml:mn></mml:mmultiscripts></mml:math> incorporation during deposition of highly enriched <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mmultiscripts><mml:mi mathvariant="normal">Si</mml:mi><mml:mprescripts /><mml:none /><mml:mn>28</mml:mn></mml:mmultiscripts></mml:math> films

Temperature-dependent Si29 incorporation during deposition of highly enriched Si28 films