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Flexible and transparent barrier film is demanded in the fields of organic solar thin-film cells, flexible organic light-emitting diodes, electronic paper and vacuum insulation boards. To prepare films with high water resistance, flexible SiOxCyHz films were prepared on PET using HMDSO as monomer and Oxygen (O 2 ) as reaction gas. SiOxCyHz films were prepared by plasma enhanced chemical vapor deposition (PECVD) with upper and lower pair electrode rolls structure, with the width of electrode rolls up to 600 mm. The influences of oxygen content, film thickness, oxygen/monomer ratio, reaction vacuum degree on water vapor transmission rate (WVTR) were studied. This coating method of oxide high barrier film has great application potential in the development of barrier film industry.

Transparent SiOxCyHz Barrier Film Prepared by PECVD with Upper and Lower Pair Electrode Rolls Structure