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This work presents a magnetron with a sputtering unit (sandwich target). The novel-$$$ty of the work is due to the three parallel plates of different metals included in the unit. They are mounted on the same axis with the magnetron and rigidly attached to it. The unit is located in a reactive environment consisting of plasma-forming argon and reactive gas (nitrogen, oxy-$$$gen, etc.). The lower plate is cold, while the middle and outer ones operate in the hot target mode. In the erosion zone of the middle and outer plates, eight slits were made. They are locat-$$$ed on the same axis and symmetrically relative to their center. The lower plate is sputtered through these slits. A magnetron with the above sandwich target can be used for the synthesis of composite films of the three-compound solid solutions. The possibility of synthesizing Ti x- Mo y Cr 1– x–y N films with a continuous change in the stoichiometric coefficients x and y due to the change in the current density and relative areas of the slits, which provide a smooth change in the hardness of the films, is shown.

Deposition of solid solution films using reactive magnetron sputtering of a sandwich target