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The created experimental magnetron sputtering system allows preliminary cleaning of the substrate surface and subsequent deposition of coatings on long cylindrical products within a single system using a coaxial magnetron discharge at a working gas pressure of 150 mTorr. The coating discharge has reverse electrodes polarity relative to the cleaning discharge. A theoretical calculation of the discharge parameters has been carried out.

Cleaning substrates and subsequent deposition of coatings with coaxial magnetron discharge