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The aim of the work was to obtain and study films of porous silicate glass. The proposed method for producing porous films is based on the rapid cooling of the melt on the surface of a glass plate after exposure to short pulses of argon plasma generated on an electrodischarge installation of plasma focus type. Silicate glass films obtained by such method have the properties of both porous glasses and foam glass. The specific volume density of these films is ∼ 0.4 g/cm 3 , their porosity and hygroscopicity correspondingly ∼ 0.3 and ∼ 30%

Production of porous films of silicate glass using a plasma focus setup