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Synopsis For many attractive applications of single layer MoS 2  such as in optoelectronics e.g., the sample is supported by a substrate. Its importance for the modification through ion irradiation is here experimentally investigated by the analysis of sputtered particle of MoS 2  on SiO 2  and Au substrates under highly charged ion irradiation. The velocity distribution of the sputtered atoms is less affected by the substrate using highly charged projectiles than using slightly charged ones. Furthermore, we can show that potential sputtering causes additional emission of particles with lower kinetic energy.

Particle emission from two-dimensional MoS2 induced by highly charged ion impact