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The technology of antireflective coatings formation on textured silicon by magnetron sputtering was developed. The growth rates of individuals thin films were determined as well as their refractive indexes. According to the results obtained an antireflective coating based on SiO 2 /Si 3 N 4  on textured silicon with a thickness of SiO 2  68 nm and Si 3 N 4  of 74 nm showed the lowest reflection.

Development of antireflective coatings based on SiO2/Si3N4 on textured silicon for heterojunction solar cells