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In this work, nickel thin films were deposited on silicon and silicon dioxide by chemical deposition for creation a nickel-63 isotope beta radiation source on the active window of a silicon betavoltaic converter. The effects the samples pre-treatment and the process parameters on the nickel deposits quality were investigated. The practical recommendations for implementation of nickel plating and reuse of processed electrolytes are given.

Chemical nickel plating on a SiO2 film of the silicon betavoltaic converter active window