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In this research, TiC thin films were successfully deposited on Ti6Al4V substrate using RF magnetron sputtering under different RF power, temperature and sputtering time. The resulting properties of TiC thin film were characterized using Grazing incidence X-ray diffractometer (GIXRD), Raman spectroscopy, Field emission scanning electron microscope (FESEM) and optical profilometer for structural and surface morphology of the thin film. The results show that the properties of the TiC thin film were affected by the RF magnetron sputtering parameters. Preferential orientation (200) plane was noticed for all the coating. The Raman analysis revealed the presence of both D- mode which is as a result of structural disorder and G-mode which indicates presence of surface impurities and defects at RF power of 150 W. The thin films become homogeneous and densely packed at RF power of 200 W. The surface roughness was also investigated. The least surface roughness was found at RF Power of 200 W, time of 2.5 Hrs and temperature of 100 °C.

GIXRD, Raman and Surface analysis of TiC thin film coating produced by RF Magnetron Sputtering