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Effect of O 2  flow rate on the kinetics of growth and properties of α-Al 2 O 3  coatings deposited by reactive anodic Al evaporation at 640 °C has been studied. It has been shown that the growth rate of coatings changes non-monotonously with O 2  flow, rise of the growth rate is due to the increase in the concentration of atomic oxygen in plasma, and the decrease at large O 2  flows is associated with transition from the mode of free transit of Al atoms to the diffusion mode.

Effect of oxygen flow rate on the deposition rate of α-Al2O3 coatings by anodic evaporation of Al in an arc discharge

Effect of oxygen flow rate on the deposition rate of α-Al₂O₃ coatings by anodic evaporation of Al in an arc discharge