Probing relaxations of atomic-scale junctions in the Pauli repulsion range
Author(s) -
Joachim Brand,
N. Néel,
J. Kröger
Publication year - 2019
Publication title -
new journal of physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.584
H-Index - 190
ISSN - 1367-2630
DOI - 10.1088/1367-2630/ab4c84
Subject(s) - physics , van der waals force , pauli exclusion principle , superposition principle , range (aeronautics) , atomic units , atomic physics , electrostatics , condensed matter physics , molecule , molecular physics , chemical physics , quantum mechanics , composite material , materials science
Clean metal as well as C 60 -terminated tips of an atomic force microscope probe the interaction with C 60 molecules adsorbed on Cu(111) and Pb(111). The force measurements unveil a monotonic shift of the point of maximum attraction with the bias voltage. The conventional superposition of long-range van der Waals and electrostatic forces with short-range Pauli repulsion does not reproduce the shift. By phenomenologically including bias-dependent relaxations of the electrode geometry in the analytical expression for the short-range force the experimental data can qualitatively be described.
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