Open AccessHighly dispersed Co deposited on Al 2 O 3 particles via CoCp 2 + H 2 ALD
Author(s) -
Jacob M. Clary,
Staci A. Van Norman,
Hans H. Funke,
Dong Su,
Charles B. Musgrave,
Alan W. Weimer
Publication year - 2020
Publication title -
nanotechnology
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.926
H-Index - 203
eISSN - 1361-6528
pISSN - 0957-4484
DOI - 10.1088/1361-6528/ab68e1
Subject(s) - atomic layer deposition , steric effects , decomposition , adsorption , materials science , ligand (biochemistry) , cobalt , cyclopentadienyl complex , nanoparticle , deposition (geology) , crystallography , chemical engineering , nanotechnology , chemistry , layer (electronics) , catalysis , stereochemistry , organic chemistry , biochemistry , metallurgy , engineering , sediment , paleontology , receptor , biology
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