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In the present study we report on properties of ZnCoO films grown at relatively low temperature by the atomic layer deposition, using two reactive organic zinc precursors (dimethylzinc and diethylzinc). The use of these precursors allowed us the significant reduction of a growth temperature to below 300 °C. The influence of growth conditions on the Co distribution in ZnCoO films, their structure and magnetic properties was investigated using secondary ion mass spectroscopy, scanning electron microscopy, cathodoluminescence, energy dispersive X‐ray spectrometry (EDX), X‐ray diffraction and superconducting quantum interference device magnetometry. We achieved high uniformity of the films grown at 160 °C. Such films are paramagnetic. Films grown at 200 °C and at higher temperature are nonuniform. Formation of foreign phases in such films was detected using high resolution EDX method. These samples are not purely paramagnetic and show weak ferromagnetic response at low temperature.

physica status solidi (b)

Effects related to deposition temperature of ZnCoO films grown by atomic layer deposition – uniformity of Co distribution, structural, optical, electrical and magnetic properties