Open AccessLiquid‐Phase Quasi‐Epitaxial Growth of Highly Stable, Monolithic UiO‐66‐NH 2 MOF thin Films on Solid Substrates
Author(s) -
Hashem Tawheed,
Valadez Sánchez Elvia P.,
Weidler Peter G.,
Gliemann Hartmut,
Alkordi Mohamed H.,
Wöll Christof
Publication year - 2020
Publication title -
chemistryopen
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 29
ISSN - 2191-1363
DOI - 10.1002/open.201900324
Subject(s) - epitaxy , materials science , chemical engineering , phase (matter) , thin film , liquid phase , nanotechnology , chemistry , organic chemistry , physics , thermodynamics , engineering , layer (electronics)
High quality, monolithic UiO‐66‐NH 2 thin films on diverse solid substrates have been prepared via a low temperature liquid phase epitaxy method. The achievement of continuous films with low defect densities and great stability against high temperatures and hot water is proven, clearly outperforming other reported types of MOF thin films.