A COMPARATIVE STUDY OF METAL OXIDE AND METAL/OXIDE/SILICA THIN FILMS Deposited by LP microwave plasma process frommetalorganic precursors : Zirconium (IV) t-Butoxide and Titanium (IV) Isopropoxide | Zendy

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A COMPARATIVE STUDY OF METAL OXIDE AND METAL/OXIDE/SILICA THIN FILMS Deposited by LP microwave plasma process frommetalorganic precursors : Zirconium (IV) t-Butoxide and Titanium (IV) Isopropoxide

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