English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

Optical lithography is the main enabler to semiconductor manufacturing. Itrequires extensive processing to perform the Resolution Enhancement Techniques(RETs) required to transfer the design data to a working Integrated Circuits(ICs). The processing power and computational runtime for RETs tasks is everincreasing due to the continuous reduction of the feature size and theexpansion of the chip area. State-of-the-art research sought Machine Learning(ML) technologies to reduce runtime and computational power, however they arestill not used in production yet. In this study, we analyze the reasons holdingback ML computational lithography from being production ready and present anovel highly scalable end-to-end flow that enables production ready ML-RETcorrection.

Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction