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Practical extreme ultraviolet (EUV) sources yield the desired 13.5 nmradiation but also generate debris, significantly limiting the lifespan of thecollector mirror in lithography. In this study, we explore the role of buffergas in transporting debris particles within a EUV source vessel using directnumerical simulations (DNS). Our study involves a 2m $\times$ 1m $\times$ 1mrectangular cavity with an injecting jet flow subjected to sideward outlet.Debris particles are introduced into the cavity with specified initialvelocities, simulating a spherical radiating pattern with particle diametersranging from 0.1 $\mu$m to 1 $\mu$m. Varying the inflow velocity (from $1$m/sto $50$m/s) of the buffer gas reveals a morphological transition in the flowfield. At low inflow velocities, the flow remains steady, whereas higher inflowvelocities induce the formation of clustered corner rolls. Upon reachingsufficiently high inflow velocities, the jet flow can penetrate the entirecavity, impacting the endwall. Interestingly, the resulting recirculation flowleads to the spontaneous formation of spiraling outflow. The distinct flowstructures at various inflow velocities lead to distinct patterns of particletransport. For low-speed gas, it is efficient in expelling all particlessmaller than 0.4 $\mu$m, while for high-speed gas, those fine particlesaccumulate near the endwall and are challenging to be extracted. Our findingshighlight the significance of controlling flow conditions for effective debrisparticle transport and clearance in diverse applications especially in EUVsource vessels.

Numerical simulation of flow field and debris migration in extreme ultraviolet source vessel