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HVE-400 ion implanter is special ion implantation equipment for semiconductormaterials boron and phosphorus doping. The ion source and extraction deflectionsystem are at high voltage platform, while the corresponding control system isat ground voltage position. The control signals and measurement signals ofvarious parameters at the high-voltage end need to be transmitted betweenground voltage and high voltage through optical fibers to isolate high voltage.Upgrading is carried out due to the aging of the optical fiber transmissioncontrol and monitoring system, which cannot work stably. The transformationreplaces the original distributed single-point control method with an advanceddistributed centralized control method, and integrates all control andmonitoring functions into an industrial control computer for digital operationand display. In the computer software, two kinds of automatic calculation ofion mass number are designed. After upgrading, the implanter high-voltageplatform control and monitoring system features digitalization, centralizedcontrol, high reliability, strong anti-interference, fast communication speed,and easy operation.

Digital Transformation of High Voltage Isolation Control and Monitoring System for HVE-400 Ion Implanter