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We report a thin-film lithium niobate electro-optic isolator fabricated byphotolithography-assisted chemo-mechanical etching in this work. The devicedemonstrates 39.50 dB isolation when subjected to a 24 GHz microwave of 25.5dBm on its electrodes. The measured isolation remains consistently above 30 dBwithin the 1510 nm to 1600 nm wavelength range. The overall device insertionloss, specifically the fiber-to-fiber insert loss, has been measured to be 2.6dB, which is attributed to our highly efficient spot size converter and the lowpropagation loss observed in the fabricated waveguides.

Thin Film Lithium Niobate Electro-optic Isolator Fabricated by photolithography assisted chemo-mechanical etching (PLACE)