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The absence of efficient light modulators for extreme ultraviolet (EUV) andX-ray photons significantly limits their real-life application, particularlywhen even slight complexity of the beam patterns is required. Here we report ona novel approach to reversible imprinting of a holographic mask in anelectronic Wigner crystal material with a sub-90 nm feature size. The structureis imprinted on a sub-picosecond time-scale using EUV laser pulses and acts asa high-efficiency diffraction grating that deflects EUV or soft X-ray light.The imprinted nanostructure is stable after the removal of the exciting beamsat low temperatures but can be easily erased by a single heating beam. Modelingshows that the efficiency of the device can exceed 1%, approachingstate-of-the-art etched gratings, but with the benefit of being programmableand tunable over a large range of wavelengths. The observed effect is based onthe rapid change of lattice constant upon transition between metastableelectronically-ordered phases in a layered transition metal dichalcogenide. Theproposed approach is potentially useful for creating tunable light modulatorsin the EUV and soft X-ray spectral ranges.

A high-efficiency programmable modulator for extreme ultraviolet light with nm feature size based on an electronic phase transition