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The invention of scanning tunneling microscope (STM) dates back to the workof Binnig and Rohrer in the early 1980s, whose seminal contribution wasrewarded by the 1986 Nobel Prize in Physics for the design of the scanningtunneling microscope. Forty years later, the STM remains the best existing toolfor studying electronic, chemical, and physical properties of conducting andsemiconducting surfaces with atomic precision. It has opened entirely newfields of research, enabling scientists to gain invaluable insight intoproperties and structure of matter at the atomic scale. Recent breakthroughs inSTM-based automated hydrogen depassivation lithography (HDL) on silicon haveresulted in the STM being considered a viable tool for fabrication oferror-free silicon-based quantum-electronic devices. Despite the STM's uniqueability to interrogate and manipulate matter with atomic precision, it remainsa challenging tool to use. It turns out that many issues can be traced back tothe STM's feedback control system, which has remained essentially unchangedsince its invention about 40 years ago. This article explains the role offeedback control system of the STM and reviews some of the recent progress madepossible in imaging, spectroscopy, and lithography by making appropriatechanges to the STM's feedback control loop. We believe that the full potentialof the STM is yet to be realized, and the key to new innovations will be theapplication of advanced model-based control and estimation techniques to thissystem.

Model-based Control of the Scanning Tunneling Microscope: Enabling New Modes of Imaging, Spectroscopy, and Lithography