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Amorphous interfacial complexions are particularly resistant to radiationdamage and have been primarily studied in alloys with good glass-formingability, yet recent reports suggest that these features can form even inimmiscible alloys such as Cu-Ta under irradiation. In this study, themechanisms of damage production and annihilation due to primary knock-on atomcollisions are investigated for amorphous interphase and grain boundaries in aCu-Ta alloy using atomistic simulations. Amorphous complexions, in particularamorphous interphase complexions that separate Cu and Ta grains, result in lessresidual defect damage than their ordered counterparts. Stemming from thenanophase chemical separation in this alloy, the amorphous complexions exhibita highly heterogeneous distribution of atomic excess volume, as compared to agood glass former like Cu-Zr. Complexion thickness, a tunable structuraldescriptor, plays a vital role in damage resistance. Thicker interfacial filmsare more damage-tolerant because they alter the defect production rate due todifferences in intrinsic displacement threshold energies during the collisioncascade. Overall, the findings of this work highlight the importance ofinterfacial engineering in enhancing the properties of materials operating inradiation-prone environments and the promise of amorphous complexions asparticularly radiation damage-tolerant microstructural features.

Enhanced radiation damage tolerance of amorphous interphase and grain boundary complexions in Cu-Ta