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W-SiC composite material is a promising alternative due to the low neutronactivation, low impurity radiation, and ductility of SiC at high temperatureswhile leveraging the high erosion resistance of the W armor. Additionally, Wand SiC have high compatibility given their similar thermal expansion rates.The present study addresses the synthesis and performance of compositionallygraded W-SiC films fabricated by pulsed-DC magnetron sputtering. Compositionalgradients were characterized using transmission electron microscopy (TEM) andenergy-dispersive X-ray spectroscopy (EDS), and crystallographic informationwas obtained using electron diffraction and X-ray diffraction (XRD). Sampleswere exposed to L-mode deuterium plasma discharges in the DIII-D tokamak usingthe Divertor Material Evaluation System (DiMES). Post-mortem characterizationswere performed using scanning electron microscopy (SEM) and XRD. Electrondiffraction and XRD showed that the compositionally graded W-SiC films werecomposed of polycrystalline W and amorphous SiC with amorphous W+SiCinterlayers. No macroscopic delamination or microstructural changes wereobserved under mild exposure conditions. This study serves as a preliminaryexamination of W-SiC compositionally graded composites as a potential candidatedivertor material in future tokamak devices.

Investigation of W-SiC compositionally graded films as a divertor material