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Photonic integrated circuits based on Lithium Niobate have demonstrated thevast capabilities afforded by material with a high Pockels coefficient,allowing linear and high-speed modulators operating at CMOS voltage levels forapplications ranging from data-center communications and photonic acceleratorsfor AI. However despite major progress, the industrial adoption of thistechnology is compounded by the high cost per wafer. Here we overcome thischallenge and demonstrate a photonic platform that satisfies the dichotomy ofallowing scalable manufacturing at low cost, while at the same time exhibitingequal, and superior properties to those of Lithium Niobate. We demonstrate thatit is possible to manufacture low loss photonic integrated circuits usingLithium Tantalate, a material that is already commercially adopted for acousticfilters in 5G and 6G. We show that LiTaO3 posses equally attractive opticalproperties and can be etched with high precision and negligible residues usingDUV lithography, diamond like carbon (DLC) as a hard mask and alkaline wetetching. Using this approach we demonstrate microresonators with an intrinsiccavity linewidth of 26.8 MHz, corresponding to a linear loss of 5.6 dB/m anddemonstrate a Mach Zehnder modulator with Vpi L = 4.2 V cm half-wave voltagelength product. In comparison to Lithium Niobate, the photonic integratedcircuits based on LiTaO3 exhibit a much lower birefringence, allowinghigh-density circuits and broadband operation over all telecommunication bands(O to L band), exhibit higher photorefractive damage threshold, and lowermicrowave loss tangent. Moreover, we show that the platform supports generationof soliton microcombs in X-Cut LiTaO3 racetrack microresonator withelectronically detectable repetition rate, i.e. 30.1 GHz.

Lithium tantalate electro-optical photonic integrated circuits for high volume manufacturing