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Achieving large-scale kinetic modelling is a crucial task for the developmentand optimization of modern plasma devices. With the trend of decreasingpressure in applications such as plasma etching, kinetic simulations arenecessary to self-consistently capture the particle dynamics. The standard,explicit, electrostatic, momentum-conserving Particle-In-Cell method suffersfrom restrictive stability constraints on spatial cell size and temporal timestep, requiring resolution of the electron Debye length and electron plasmaperiod respectively. This results in a very high computational cost, making thetechnique prohibitive for large volume device modeling. We investigate theDirect Implicit algorithm and the explicit Energy Conserving algorithm asalternatives to the standard approach, both of which can reduce computationalcost with a minimal (or controllable) impact on results. These algorithms areimplemented into the well-tested EDIPIC-2D and LTP-PIC codes, and theirperformance is evaluated via 2D capacitively coupled plasma dischargesimulations. The investigation revels that both approaches enable theutilization of cell sizes larger than the Debye length, resulting in reducedruntime, while incurring only minor inaccuracies in plasma parameters. TheDirect Implicit method also allows for time steps larger than the electronplasma period, however care must be taken to avoid numerical heating orcooling. It is demonstrated that by appropriately adjusting the ratio of cellsize to time step, it is possible to mitigate this effect to an acceptablelevel.

Direct Implicit and Explicit Energy-Conserving Particle-in-Cell Methods for Modeling of Capacitively-Coupled Plasma Devices