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We present an experimental study on the etching of detonation nanodiamond(DND) seeds during typical microwave chemical vapor deposition (MWCVD)conditions leading to ultra-thin diamond film formation, which is fundamentalfor many technological applications. The temporal evolution of the surfacedensity of seeds on Si(100) substrate has been assessed by scanning electronmicroscopy (SEM). The resulting kinetics have been explained in the frameworkof a model based on the effect of particle size, according to the Young-Laplaceequation, on both chemical potential of carbon atoms in DND and activationenergy of reaction. We found that seeds with size smaller than a criticalradius, r*, are etched away while those greater than r* can grow. Finally, themodel allows to estimate the rate coefficients for growth and etching from theexperimental kinetics.

Size dependent etching of nanodiamond seeds in the early stages of CVD diamond growth