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This work represents a particular application of waveguide fabricated byfemtosecond laser micromachining technology. More specifically, we report thedevelopment of an optical modulator based on the fabrication of single-modeoptical waveguide structures buried in X-cut lithium niobate crystal with thefemtosecond laser direct writing method. Here, change in refractive indexprofile is measured using near field intensity profile measurement method atoptimized writing conditions. It has been observed that the change refractiveindex ({\Delta}n) is in the range of 10-4. Finally, the behavior of femtosecondwritten waveguides as an intensity modulator at 632.8 nm and 1550 nm under theinfluence of an external electric field is analyzed by pattering electrodestructures on the substrate respectively.

Electro optic effect measurements for waveguide inscribed in X-cut LiNbO3 substrate using femtosecond laser direct writing process