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Although two-dimensional transition metal carbides and nitrides (MXenes) havefantastic physical and chemical properties as well as wide applications, itremains challenging to produce stable MXenes due to their rapid structuraldegradation. Here, unique metal-bonded atomic layers of transition metalcarbides with high stabilities are produced via a simple topological reactionbetween chlorine-terminated MXenes and selected metals, where the metals enableto not only remove Cl terminations, but also efficiently bond with adjacentatomic MXene slabs, driven by the symmetry of MAX phases. The films constructedfrom Al-bonded Ti$_3$C$_2$Cl$_x$ atomic layers show high oxidation resistanceup to 400 degrees centigrade and low sheet resistance of 9.3 ohm per square.Coupled to the multi-layer structure, the Al-bonded Ti$_3$C$_2$Cl$_x$ filmdisplays a significantly improved EMI shielding capability with a totalshielding effectiveness value of 39 dB at a low thickness of 3.1 micron,outperforming pure Ti$_3$C$_2$Cl$_x$ film.

Metal-bonded Atomic Layers of Transition Metal Carbides (MXenes)