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We present a robust, precise, and accurate method to simultaneously measurethe refractive indices of two transparent materials within an interferencecoating. This is achieved by measuring both a photometrically accuratetransmittance spectrum and the as-grown individual layer thicknesses of athin-film multilayer structure. These measurements are used for a TMM-basedcurve-fitting routine which extracts the refractive indices and theirmeasurement uncertainties via a Monte-Carlo-type error propagation. Wedemonstrate the performance of this approach by experimentally measuring therefractive indices of both, GaAs and Al$_{0.929}$Ga$_{0.071}$As, as present inan epitaxial distributed Bragg reflector. A variety of devices can be used toobtain the transmittance spectrum (e.g., FTIR, grating-based spectrophotometer)and layer thicknesses (e.g., SEM, TEM, AFM), the discussed approach is readilyadaptable to virtually any wavelength region and many transparent materialcombinations of interest. The subsequent model-fitting approach yieldsrefractive index values with $10^{-4}$-level uncertainty for both materials.

Precise Measurement of Refractive Indices in Thin Film Heterostructures