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We demonstrate an axisymmetric inverse-designed metalens to improve theperformance of zone-plate-array lithography (ZPAL), one of the masklesslithography approaches, that offer a new paradigm for nanoscale research andindustry. First, we derive a computational upper bound for a unit-cell-basedaxisymmetric metalens. Then, we demonstrate a fabrication-compatibleinverse-designed metalens with 85.50\% transmission normalized focusingefficiency at 0.6 numerical aperture at 405nm wavelength; a higher efficiencythan a theoretical gradient index lens design (79.98\%). We also demonstrateexperimental validation for our axisymmetric inverse-designed metalens viaelectron beam lithography. Metalens-based maskless lithography may open a newway of achieving low-cost, large-area nanofabrication.

Inverse Design of High-NA Metalens for Maskless Lithography