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A study of wetting was carried out on porous silicon films with porediameters spanning three orders of magnitude. Water contact angle measurementson adjoining porous and nonporous regions yielded Wenzel roughness ratios thatwere either unphysical (less than unity) or unrealistically low when comparedto those expected from specific surface area considerations. Moreover, resultsobtained from a sample consisting of a microporous film on a macroporous layergave contact angles that were very similar to those found on films consistingof only a single microporous layer, contrary to what would be expected forcomplete filling of the pores by liquid. Values for wetted surface fractionscalculated from the Cassie-Baxter model are unreasonably high for micro- ,meso- and oxidized macroporous films considering their porosities, whilerelatively oxide-free macroporous films give wetted surface fractions in accordwith those expected based on film porosity. Collectively, these results showthat the predominant mode of wetting on these films is heterogeneous.

Contact Angle Studies on Porous Silicon: Evidence for Heterogeneous Wetting and Implications of Oxidation