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The great flexibility of direct laser writing arises from the possibility tofabricate precise three-dimensional structures on very small scales as well asthe broad range of applicable materials. However, there is still a vast numberof promising materials which are currently inaccessible requiring thecontinuous development of novel photoresists. Here, a new bio-sourced resist isreported which relies on the monomeric unit of chitin, N-acetyl-D-glucosamine,expanding the existing plant-based biopolymer resists by a bio-based monomerfrom the animal kingdom. In addition it is shown that combined use of twophotoinitiators is advantageous over the use of a single one. In our approach,the first photoinitator is a good two-photon absorber at the appliedwavelength, while the second photoinitiator exhibits poor two-photon absorbtionabilities, but is better suited for crosslinking of the monomer. The firstphotoinitiator absorbs the light acting as a sensitizer and transfers theenergy to the second initiator, which subsequently forms a radical andinitializes the polymerization. This sensitization effect enables a new routeto utilize reactive photointiators with a small two-photon absorptioncross-section for direct laser writing without changing their chemicalstructure.

Utilizing the sensitization effect for direct laser writing in a novel photoresist based on the chitin monomer N-acetyl-D-glucosamine