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We propose an alternating direction method of multipliers (ADMM) to solve anoptimization problem stemming from inverse lithography. The objectivefunctional of the optimization problem includes three terms: the misfit betweenthe imaging on wafer and the target pattern, the penalty term which ensures themask is binary and the total variation regularization term. By variablesplitting, we introduce an augmented Lagrangian for the original objectivefunctional. In the framework of ADMM method, the optimization problem isdivided into several subproblems. Each of the subproblems can be solvedefficiently. We give the convergence analysis of the proposed method.Specially, instead of solving the subproblem concerning sigmoid, we solvedirectly the threshold truncation imaging function which can be solvedanalytically. We also provide many numerical examples to illustrate theeffectiveness of the method.

An alternating direction method of multipliers for inverse lithography problem