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Limited by the cost and complexity, superresolution lithography is hard toachieve through the traditional interference lithography. We here developed theplasmonic interference lithography technique by using a hyperbolicmetamaterials (HMMs) / photoresist / metal plasmonic waveguide to push thefeature sizes theoretically down to 16 nm and even to 11 nm at the wavelengthof 365 nm with TM polarization. The waveguide based on the proposed HMMs cansupport high-k mode for superresolution lithography. Furthermore, plasmonicmode supported in the proposed lithography structure can be tailored bydimension of HMM and permittivity of the materials, which makes it possible toget higher resolution pattern under conventional UV light. Our findings open upan avenue to pushing the nanolithography node towards 10 nm for low-cost andlarge area fabrication under conventional UV light source.

Pushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source