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The investigations of the reactive magnetron depositing of the stoichiometriccoatings metal-metalloid were done. The dependences between sputteringparameters of a target and processes of plasmochemical formation on the surfaceof sample metal-metalloid and formations of coatings of the appropriatestructure were investigated. Experimental data on stoichiometric coatings AlN,Al2O3, TiN, TiO2 is given. Features of reactive magnetron deposition andinvestigation results for obtaining of coatings with pregiven properties inparticular for providing stability and controllability of coating depositionprocesses in time. Keywords: reactive magnetron sputtering, coatings, oxide,nitride compositions.

Deposition of the stoichiometric coatings by reactive magnetron sputtering