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A method for combinatorial sputter deposition of thin films on microparticlesis presented. The method is developed for a laboratory-scale magnetron sputtersystem and uses a piezoelectric actuator to agitate the microparticles throughoscillation. Custom-made components enable to agitate up to nine separatebatches of particles simultaneously. Due to the agitation, the whole surface ofthe particles can be exposed to the sputter flux and thus can be completelycovered with a thin film. By sputtering a CrMnFeCoNi high entropy alloy target,separate batches of polystyrene microspheres (500 um monodisperse diameter), Fealloy particles (300 um mean size) and NaCl salt particles (350 um mean size)were simultaneously coated with a homogeneous thin film. In contrast, aCrMnFeCoNi thin film that was deposited on agglomerating Al particles (5 ummean size) only partially covers the surface of the particles. By co-sputteringa CrMn, an FeCo and a Ni target, nine separate batches of Al particles (25 ummean size) were coated with a CrMnFeCoNi thin film with a composition gradient.These depositions demonstrate the ability to coat different types of particleswith uniform films (from elemental to multinary compositions) and to depositfilms with composition gradients on uniform particles.

Combinatorial sputter deposition of CrMnFeCoNi high entropy alloy thin films on agitated particles