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Chemical modifications such as intercalation can be used to modify surfaceproperties or to further functionalize the surface states of topologicalinsulators. Using ambient pressure X-ray photoelectron spectroscopy, we reportcopper migration in $\text{Cu}_{x}\text{Bi}_2\text{Se}_3$, which occurs on atimescale of hours to days after initial surface cleaving. The increase innear-surface copper proceeds along with the oxidation of the sample surface andlarge changes in the selenium content. These complex changes are furthermodelled with core-level spectroscopy simulations, which suggest a compositiongradient near the surface which develops with oxygen exposure. Our results shedlight on a new phenomenon that must be considered for intercalated topologicalinsulators$\unicode{x2014}$and intercalated materials ingeneral$\unicode{x2014}$that surface chemical composition can change whenspecimens are exposed to ambient conditions.

Copper migration and surface oxidation of $\text{Cu}_{x}\text{Bi}_2\text{Se}_3$ in ambient pressure environments