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In this study, we investigated the influence of silicon oxide roughnessproduced from the gas precursor monosilane (SiH$_4$) and the silicon-organicprecursor tetraethoxysilane (TEOS) on the optical qualities of a distributedBragg reflector (DBR). A significant influence of the precursors from whichSiOx is deposited on the optical qualities of DBR mirrors is demonstrated inthis study. It has been shown experimentally that a mirror produced from theTEOS precursor is endowed with better qualities than a mirror produced usingSiH4, that is, the reflectivity increased by 20% and optical losses decreasedby half. The roughness average (Ra) of the SiN$_x$/SiO$_x$ / (TEOS) mirrorsurface decreased by a factor of five compared to that of the SiN$_x$/SiO$_x$ /(SiH4) mirror

Enchanced reflectance SiN$_x$ / SiO$_x$ DBR mirror based on TEOS precursor fabricated by PECVD method