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We used the Coherent Grazing Incidence Small Angle X-Ray Scattering(Co-GISAXS) technique to study the average kinetics and nanoscale dynamicsduring early-stage a-WSi$_2$ sputter deposition. The kinetic and dynamicproperties are examined as a function of pressure, which is known to be acritical factor in determining final surface roughness. Surface growth kineticsand dynamics are characterized by time parameters extracted from theheight-height structure factor and correlation functions. The roughness at agiven length scale reaches a maximum before relaxing down to a steady state.The lateral length scale dependence and pressure dependence are then comparedamong measured kinetics and dynamics time parameters. Surfaces grown at lowerpressures are smoother, leading to longer correlation times. The time to reacha dynamic steady state and a kinetic steady state show contrasting pressuredependence. A dynamic steady state is reached earlier than the kinetic steadystate at high pressure. A more random deposition direction and lower kineticenergy at higher pressures can explain these phenomena, along with thehypothesis that larger nanoclusters form in vapor before arriving at thesurface. A continuum model is applied to simulate the overall behavior withmixed success.

Early Stage Growth of Amorphous Thin Film: Average Kinetics, Nanoscale Dynamics and Pressure Dependence